Optical anisotropy of self-organized gold quasi-blazed nanostructures based on a broad ion beam.

To circumvent elaborate conventional lithographic methods for realizing metallic nanostructures, it is necessary to develop self-organized nanofabrication methods for suitable template structures and their optical characterization. We demonstrate the potential of ion bombardment with impurity co-deposition to fabricate terraced or quasi-blazed nanostructure templates. Self-organized terraced nanostructures on fused silica were fabricated using Ar+ ion bombardment with iron impurity co-deposition and subsequent Au shadow deposition. The aspect ratios are enhanced threefold, and the range of nanostructure period variation is significantly increased with respect to that of conventional nanostructures realized by pure ion bombardment. We reveal the key features of the method via atomic force microscopy and optical characterization. Variable-profile quasiperiodic nanostructures with periods of 100-450 nm, heights of 25-180 nm, and blaze angles of 10°-25° were fabricated over an area of 20×40mm2, and these exhibited tunable and broadening optical anisotropy across the nanostructured area. Thus, the proposed method is a viable technique for rapid, cost-effective, and deterministic fabrication of variable nanostructure templates for potential optical applications.

Soft X-ray varied-line-spacing gratings fabricated by near-field holography using an electron beam lithography-written phase mask.

A fabrication method comprising near-field holography (NFH) with an electron beam lithography (EBL)-written phase mask was developed to fabricate soft X-ray varied-line-spacing gratings (VLSGs). An EBL-written phase mask with an area of 52 mm × 30 mm and a central line density greater than 3000 lines mm-1 was used. The introduction of the EBL-written phase mask substantially simplified the NFH optics for pattern transfer. The characterization of the groove density distribution and diffraction efficiency of the fabricated VLSGs indicates that the EBL-NFH method is feasible and promising for achieving high-accuracy groove density distributions with corresponding image properties. Vertical stray light is suppressed in the soft X-ray spectral range.

Reducing Rowland ghosts in diffraction gratings by dynamic exposure near-field holography.

Near-field holography (NFH) combined with electron beam lithography (EBL)-written phase masks is a promising method for the rapid realization of diffraction gratings with high resolution and high accuracy in line density distribution. We demonstrate a dynamic exposure method in which the grating substrate is shifted during pattern transfer. This reduces the effects of stitching errors, resulting in the decreased intensity of the optical stray light (i.e., Rowland ghosts). We demonstrate the intensity suppression of ghosts by 60%. This illustrates the potential for dynamic NFH to suppress undesirable periodic patterns from phase masks and alleviate the stitching errors induced by EBL.

[Development of Micro-Spectrometer with a Function of Timely Temperature Compensation].

Temperature drift will be brought to Micro-Spectrometer used for demodulating the Varied Line-Space(VLS) grating position sensor on aircraft due to high-low temperature shock. We successfully made a Micro-Spectrometer, for the VLS grating position sensor on aircraft, which still have stable output under temperature shock enviro nment. In order to present a real time temperature compensation scheme, the effects temperature change has on Micro-Spectrometer are analyzed and the traditional cross Czerny-Turner (C-T)optical structure is optimized. Both optical structures are analyzed by optics design software ZEMAX and proved that comparedwithtraditional cross C-T optical structure, the newone can accomplish not only smaller spectrum drift but also spectrum drift with better linearity. Based on the new optical structure. The scheme of using reference wavelength to accomplish real time temperature compensation was proposed and a Micro-fiber Spectrometer was successfully manufactured, whith is with Volume of 80 mm X 70 mmX 70 mm, integration time of 8 ~1 000 ms and FullWidthHalfMaximum(FWHM) of 2 nm. Experiments show that the new spectrometer meets the design requirement. Under high temperature in the range of nearly 60 °C, the standard error of wavelength of this new spectrometer is smaller than 0. 1 nm, and the maximum error of wavelength is 0. 14 nm, which is much smaller than required 0. 3 nm. Innovations of this paper are the schemeof real time temperature compensation, the new cross C-T optical structure and a Micro-fiber Spectrometer based on it.

Design of multi-area grating for soft x-ray flat-field spectrograph.

A soft x-ray flat-field grating with a nominal groove density of 2400 grooves/mm is typically used in wavelengths of 1-6 nm or 1-7 nm for plasma diagnostics. However, measurement of wavelengths even down to 0.6 nm simultaneously is expected in practice. Unfortunately, a grating has a poor spectral image at wavelengths below 1.3 nm. In order to improve the spectral image at lower wavelengths, multi-area gratings (divided perpendicular to the direction of grating grooves) are devised. To reduce the contribution of certain areas with poor spectral image to the final spectral image, the profile parameters of groove on the area are optimized by suppressing spectral efficiency. Theoretical analysis demonstrates that, using multi-area gratings, the spectral image at lower wavelengths could be obviously improved; thus, the spectral resolving power at a wavelength of 0.7 nm is increased from 94 to 398.

Alignment method for fabricating a parallel flat-field grating used in soft x-ray region.

Parallel flat-field gratings consist of two flat-field gratings lying on one substrate, one for 5-20 nm and the other for 2-5 nm spectral regions, and thus can be widely used in various fields to record broader spectra in the soft x-ray region. The alignment of two subgratings directly determines the resolving power of parallel flat-field gratings. The theoretical resolving power is evaluated by means of the ray-tracing method and the maximal allowable alignment error is 0.366°. Alignment is based on diffraction patterns and moiré fringes and the total alignment error in our experiment is within 0.234°. The results demonstrate that this alignment method is an effective way for fabricating parallel flat-field gratings.

The method for measuring the groove density of variable-line-space gratings with elimination of the eccentricity effect.

To eliminate the eccentricity effect, a new method for measuring the groove density of a variable-line-space grating was adapted. Based on grating equation, groove density is calculated by measuring the internal angles between zeroth-order and first-order diffracted light for two different wavelengths with the same angle of incidence. The measurement system mainly includes two laser sources, a phase plate, plane mirror, and charge coupled device. The measurement results of a variable-line-space grating demonstrate that the experiment data agree well with theoretical values, and the value of measurement error (ΔN/N) is less than 2.72 × 10(-4).

Alignment method combining interference lithography with anisotropic wet etch technique for fabrication of high aspect ratio silicon gratings.

A method was developed for aligning interference fringes generated in interference lithography to the vertical {111} planes of <110> oriented silicon wafers. The alignment error is 0.036°. This high precision method makes it possible to combine interference lithography with anisotropic wet etch technique for the fabrication of high aspect ratio silicon gratings with extremely smooth sidewalls over a large sample area. With this alignment method, 320 nm and 2 µm period silicon gratings have been successfully fabricated. The highest aspect ratio is up to 100. The sample area is about 50 mm × 60 mm. The roughness (root mean square) of the sidewall is about 0.267 nm.

Investigation on the properties of a laminar grating as a soft x-ray beam splitter.

Laminar-type gratings as soft x-ray beam splitters for interferometry are presented. Gold-coated grating beam splitters with 1000 lines/mm are designed for grazing incidence operation at 13.9 nm. They are routinely fabricated using electron beam lithography and ion etching techniques. The laminar grating is measured to have almost equal absolute efficiencies of about 20% in the zeroth and -1st orders, which enables a fringe visibility up to 0.99 in the interferometer. The discrepancy of the grating profiles between the optimized theoretical and the experimental results is analyzed according to the comparison of the optimized simulation results and the measurement realization of the grating efficiencies. By a precise control of the grating profile, the grating efficiency in the -1st order and the fringe visibility could be improved to 25% and 1, respectively.